Bakelite^® Cresol Novolacs

Bakelite cresol novolac resins offer desirable advantages for the exacting process of etching ultrafine circuit line patterns into the photoresist surface coatings of semiconductor silicon wafers, as well as in printing plate production. Benefits of ultrahigh purity Bakelite cresol novolacs include:

• Low metals/low ionic content
• Narrow control over molecular weight with low polydispersity
• Precise viscosity control
• Custom bulk dissolution rates
• Variable meta-, para- and ortho-cresol monomer ratios
• Low free monomer options

Applications for Hexion cresol novolacs include:

• Positive photoresist formulations for semiconductor processing methods, such as g-line, i-line and advanced i-line
• Offset printing
• Epoxy intermediates for high-performance multifunctional epoxy resins